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Fundamentals of Terahertz Devices and Applications


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      2.2.2.4 Lens Reflection Efficiency

Schematic illustration of (a) high transmission and high reflection region of a silicon made elliptical lens. (b) Elliptical lens with a matching layer and its equivalent transmission line representation.

      (2.54)equation

      where the radiation efficiency, ηr, is the ratio between the power radiated by the lens into the air and the power radiated by the primary source inside the lens images.

      The amount of energy reflected inside the lens depends on how the lens feed illuminates the lens surface (see Figure 2.7b). We can identify two distinct zones as shown in Figure 2.7a. The top part of the lens is where the energy transmission is the highest, and therefore the most efficient part, whereas the lateral part leads to high reflected energy (even total at the critical angle) and therefore is the least efficient one [34]. That is why the lens feed should be designed to illuminate only the top part of the lens.

      In order to improve the reflection efficiency of lens antennas, we can use a quarter wavelength impedance transformers. This impedance transformer is typically designed for broadside radiation (top part of the lens). It can be easily analyzed using a transmission line model for the TE and TM polarizations (corresponding to orthogonal and parallel polarizations, respectively), with the characteristic impedances of the lines representing the different mediums indicated with i defined as images and images with images as shown in Figure 2.7b. Using this model, we can derive the condition for no reflection when Zin = ζd which implies that the permittivity of the antireflective layer material is imagesand its thickness images.

Graph depict the parallel and perpendicular transmission coefficient for a lens made in silicon with and without matching layer for a silicon lens.

      Silicon is the dielectric material employed in integrated lenses and circuit substrates. It is an inherently strong and excellent material in terms of losses, due to its high resistivity (≥10 kΩ cm), which lowers the loss tangent to tan δ ≤ 10−4. It has also a large thermal conductivity, meaning that for cryogenic applications it will absorb little of the incoming heat load and conduct it efficiently to the edge where the heat sinks are mounted. Moreover, thanks to its uniformity and homogeneity, it is a material well suited for polarization measurements. The high permittivity of silicon (εr ≈ 11.9) allows designs with strong focusing and smaller thicknesses; however, it presents a major drawback in terms of reflection losses. At submillimeter‐wave frequencies, the plastic Parylene‐C is extensively used as an antireflective layer thanks to the close match to the ideal index and its deposition through pyrolysis [35]. Other plastics such as Cirlex have suitable permittivity, but they are glued to the silicon with lossy epoxy adhesive [36]. Other methods include the synthesis of artificial dielectric coatings through the patterning of subwavelength grooves through micro‐machining processes [37]. This artificial dielectric coating can synthesize the desired permittivity and behave as a continuous medium providing the closest match to the ideal antireflective coating.

      While elliptical lenses reach the highest possible directivity, extended hemispherical lenses are often employed to ease their fabrication. This alternative configuration can have a close performance to the elliptical when the primary feed is designed in such a way to excite only the upper part of the dielectric lens and a dense material is used. The dimensions of the lens are chosen to approximate the focusing properties of the elliptical lens when the feed is placed at the foci. The synthesis of the ellipse is achieved using a semi‐hemisphere of unit radius defined as:

      (2.55)equation

      (2.56)equation

      It can also be synthesized the other way around, from an extended